UV Excimer CLS 5000 laser series
UV Excimer CLS 5000 laser series
UV Excimer CLS 5000 laser series
CLS-5000 is a compact 193 nm compact excimer laser. It is also available in different configurations with 248 nm and 308 nm wavelengths. It has an outstanding beam stability performance because of its extra features in positioning and pointing, which makes CLS5000 a great solution for a number of different applications. This short wavelength laser has high repetition rate, which is very important for material ablation processes optical projection lithography using photomasks.Magnetic switch generator and builtin energy monitor makes Optromix CLS5000 very user friendly and convenient.
Key features
●Very high beam position stability
●Very high beam pointing stability
●High repetition rate
●Magnetic switch generator
●Compact excimer laser
●Built-in Energy monitor
●Energy stabilization
Applications
● Spectroscopy
● FBG writing
● Material processing
● Micromarking
● DUV Lithography
CLS-5000 series specification
Parameter |
Value |
||
Gas mixture |
ArF |
KrF |
XeCl |
Wavelength |
193 nm |
248 nm |
308 nm |
Nominal Pulse Energy |
15 mJ |
25 mJ |
12 mJ |
Average Power |
7.5 W |
12.5 W |
6 W |
Max. repetition rate |
500 Hz |
||
Pulse duration |
11 ns |
12 ns |
|
Pulse energy stability |
sigma < 2% |
||
Beam size (V * H) |
6 mm x 3.5 mm |
6 mm x 4 mm |
|
Beam Divergence (V * H) |
2 mrad x 1 mrad (stable resonator) |
||
Time jitter |
< 2 ns |
||
Gas |
1 premix cylinder |
||
Cooling |
water < 1 liter/min |
||
Control interface |
RS232 (Windows) |
||
Power consumption |
220 240 V, 50 60 Hz, 1 kW |
||
Dimensions (W x H x L) |
336 x 454 x 887 mm |
||
Weight |
85 kg |