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UV Excimer CLS 5000 laser series

UV Excimer CLS 5000 laser series

UV Excimer CLS 5000 laser series

UV Excimer CLS 5000 laser series

CLS-5000 is a compact 193 nm compact excimer laser. It is also available in different configurations with 248 nm and 308 nm wavelengths. It has an outstanding beam stability performance because of its extra features in positioning and pointing, which makes CLS5000 a great solution for a number of different applications. This short wavelength laser has high repetition rate, which is very important for material ablation processes optical projection lithography using photomasks.Magnetic switch generator and builtin energy monitor makes Optromix CLS5000 very user friendly and convenient.

Key features

Very high beam position stability

Very high beam pointing stability

High repetition rate

Magnetic switch generator

Compact excimer laser

Built-in Energy monitor

Energy stabilization

Applications

Spectroscopy

FBG writing

Material processing

Micromarking

DUV Lithography

CLS-5000 series specification

Parameter

Value

Gas mixture

ArF

KrF

XeCl

Wavelength

193 nm

248 nm

308 nm

Nominal Pulse Energy

15 mJ

25 mJ

12 mJ

Average Power

7.5 W

12.5 W

6 W

Max. repetition rate

500 Hz

Pulse duration

11 ns

12 ns

Pulse energy stability

sigma < 2%

Beam size (V * H)

6 mm x 3.5 mm

6 mm x 4 mm

Beam Divergence (V * H)

2 mrad x 1 mrad (stable resonator)

Time jitter

< 2 ns

Gas

1 premix cylinder

Cooling

water < 1 liter/min

Control interface

RS­232 (Windows)

Power consumption

220 ­ 240 V, 50 ­ 60 Hz, 1 kW

Dimensions (W x H x L)

336 x 454 x 887 mm

Weight

85 kg

UV Excimer CLS 5000 laser series

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