PMGI/LOR Lift-off Resists

PMGI Lift-off Resists

Enable high yield, metal lift-off processing in a range of applications from data storage and wireless ICs to MEMS.

• High thermal stability: Tg ∼190C
• Enables sub 0.25µm bi-layer resist imaging
• Single step development of bi-layer stack in TMAH or KOH developers

Ancillaries:

• MCC Developers
• Remover PG
• MCC Thinner
• EBR-PG