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LOR Lift-off Resists MicroChem

LOR Lift-off Resists


Enable high yield, metal lift-off processing in a range of applications from data storage and wireless ICs to MEMS.

  • High thermal stability: Tg ∼190C
  • Enables sub 0.25µm bi-layer resist imaging
  • Single step development of bi-layer stack in TMAH or KOH developers


  • MCC Developers
  • Remover PG
  • MCC Thinner
  • EBR-PG


  • Cantilevers
  • Bi-layer Lift-off
  • T-gates
  • Microlenses
  • Airbridges

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